|
Plasma Enhanced Chemical Vapour Deposition
 14" Stainless Steel Chamber
 Turbo pump backed with a rotary pump
 ICP P200 RF Source with Dressler 1KW PS
 Two modes: RF BIAS 300W to substrate platen and DC BIAS 1000V to substrate platen.
 6" Stainless Steel Platen
 Platen heater to 800oC
 8 MFC's
 Computer controlled
|